Recently, inorganic halide perovskites, especially CsPbBr, have been attracting attention because of their high efficiency, wide color gamut, and narrow luminescent spectrum. To elevate the perovskite devices' performance, optimizations of crystalline quality, device structures, and fabrication process are essential. Currently, the state-of-the-art fabrication approach of CsPbBr is spin-coating in an inert environment (nitrogen, argon, etc.), which requires temperature and humidity control. In this work, a CsPbBr-based visible photodetector (PD) is realized in a humid atmosphere, whose performances were comparable to those reported in an inert glovebox. The dependencies of responsivity and transient time on CsBr coating layer numbers and electrode period were also investigated. The best device performance was obtained with 4 layers of CsBr coating with a responsivity of 107.2 mA/W, detectivity of 4.29 × 10 Jones, and quantum efficiency of 25.4%. The rise time of the 3-4-layer CsBr-coated PD was reduced by the higher crystalline quality and carrier mobility, while the decay time of the 1-layer CsBr-coated PD was faster since the dense defect induced non-radiative recombination centers. With the period T increasing, the responsivity decreased, while the transient times increased. We believe that our results could benefit the future optimization of perovskite materials and PDs.
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http://dx.doi.org/10.1364/OL.485858 | DOI Listing |
Nat Commun
January 2025
School of Integrated Circuits and Frontier Science Center for Quantum Information, Tsinghua University, Beijing, China.
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January 2025
Hoffmann Institute of Advanced Materials, Shenzhen Polytechnic University, Shenzhen, 518055, People's Republic of China.
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Strathclyde Institute of Pharmacy and Biomedical Sciences, University of Strathclyde, 161 Cathedral St., Glasgow G4 0RE,Scotland,U.K.
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January 2025
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea.
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View Article and Find Full Text PDFNano Lett
January 2025
Electron Microscopy Center, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, 8600 Dübendorf, Switzerland.
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