Few-layer graphene was successfully synthesized on copper foil via chemical vapor deposition with methanol as a carbon source. This was confirmed by optical microscopy observation, Raman spectra measurement, I/I ratio calculation, and 2D-FWHM value comparisons. Monolayer graphene was also found in similar standard procedures, but it required higher growth temperature and longer time periods. The cost-efficient growth conditions for few-layer graphene are thoroughly discussed via TEM observation and AFM measurement. In addition, it has been confirmed that the growth period can be shortened by increasing growth temperature. With the H gas flow rate fixed at 15 sccm, few-layer graphene was synthesized at the lower growth temperature of 700 °C in 30 min, and at 900 °C growth temperature in only 5 min. Successful growth was also achieved without adding hydrogen gas flow; this is probably because H can be induced from the decomposition of methanol. Through further defects study of few-layer graphene via TEM observation and AFM measurement, we tried to find possible ways for efficiency and quality management in graphene synthesis in industrial applications. Lastly, we investigated graphene formation after pre-treatment with different gas compositions, and found that gas selection is a crucial factor for a successful synthesis.
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http://dx.doi.org/10.3390/nano13061136 | DOI Listing |
Nat Commun
December 2024
Department of Chemical Engineering, The University of Melbourne, Parkville, Victoria, Australia.
Colloidal properties of nanoparticles are intricately linked to their morphology. Traditionally, achieving high-concentration dispersions of two-dimensional (2D) nanosheets has proven challenging as they tend to agglomerate or re-stack under increased surface contact and Van der Waals attraction. Here, we unveil an excluded volume effect enabled by 2D morphology, which can be coupled with electrostatic repulsion to synthesize high-concentration aqueous graphene dispersions.
View Article and Find Full Text PDFJ Am Chem Soc
December 2024
Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China.
The nonlinear optical response in graphene is finding increasing applications in nanophotonic devices. The activation and enhancement of second harmonic generation (SHG) in graphene, which is generally forbidden in monolayer and AB-stacked bilayer graphene due to their centrosymmetry, is of urgent need for nanophotonic applications. Here, we present a comprehensive study of SHG performance of twisted multilayer graphene structures based on stacking engineering.
View Article and Find Full Text PDFSmall
December 2024
Department of Materials Science and Engineering, Indian Institute of Technology Delhi, Hauz Khas, New Delhi, 110016, India.
Despite the ubiquitous use of glasses, their simultaneous susceptibility toward scratch-induced defects and atmospheric hydration deteriorates their mechanical and chemical durability. Here, it is demonstrated that the deposition of a few-layer graphene provides unprecedented wear resistance to silica glass in aqueous conditions. To this extent, nanoscale scratch tests are carried out on graphene-glass surfaces via contact-mode atomic force microscopy with chemically inert and reactive tips.
View Article and Find Full Text PDFNatl Sci Rev
December 2024
Key Laboratory of Bionic Engineering, Ministry of Education, Jilin University, China.
Natural few-layer graphene is unambiguously identified from the Chang'e-5 lunar soil samples, which serves as a new platform for investigating extraterrestrial bodies.
View Article and Find Full Text PDFNanoscale
December 2024
Boston University, Department of Mechanical Engineering, Boston, MA 02215, USA.
We measure the out-of-plane shear modulus of few-layer graphene (FLG) by a blister test. During the test, we employed a monolayer molybdenum disulfide (MoS) membrane stacked onto FLG wells to facilitate the separation of FLG from the silicon oxide (SiO) substrate. Using the deflection profile of the blister, we determine an average shear modulus of 0.
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