Enhanced dielectric and electrical performance of phosphonic acid-modified tantalum (Ta)-doped potassium sodium niobate (KNaNbO)-P(VDF-HFP) composites.

PA-KNNT-P(VDF-HFP) composite films were synthesized using facile solution casting technique. Due to their wide range of applications in dielectric and electrical systems, phosphonic acid (PA)-modified tantalum-doped potassium sodium niobate (KNNT)-polyvinylidene fluoride co-hexafluoropropylene P(VDF-HFP) composite films have piqued the interest of academic researchers. Microstructural analysis showed that PA layers incorporated onto the KNNT particles within the polymer matrix. The PA-KNNT-P(VDF-HFP) composite exhibited improved dielectric and electrical performance over a broad range of frequency, and the value of the dielectric constant of the P(VDF-HFP) composites is improved by ≈119 over the P(VDF-HFP) matrix at a filler loading 19 wt.%. Moreover, PA-KNNT-P(VDF-HFP) composite also reveals higher dielectric constant (≈ 119) and AC conductivity than P(VDF-HFP)-KNNT composites, while maintaining suppressed dielectric loss ([Formula: see text] at 10 Hz). It is also observed that the PA-KNNT-P(VDF-HFP) composite exhibited an insulator-conductor transition with a percolation threshold of f = 13.4 wt.%. As a result of their exceptional dielectric and electrical characteristics, PA-KNNT-P(VDF-HFP) composites have the potential to find exciting practical applications in a variety of electronic domains.