AI Article Synopsis

  • This study investigates how residual carbon on p-GaN photocathodes affects their quantum efficiency, emphasizing the importance of a clean surface for achieving negative electron affinity.
  • The research utilizes an in-situ X-ray photoelectron spectrometer (XPS) to monitor changes on the photocathode surface during cleaning, activation, and degradation processes.
  • Despite the presence of carbon and oxygen contaminants from the manufacturing process, activating p-GaN with cesium allows for the formation of negative electron affinity and reveals the role of cesium carbide in photocathode performance degradation.

Article Abstract

This study shows residual surface carbon's influence on photocathodes' quantum efficiency based on p-GaN grown on sapphire by metal organic chemical vapor deposition. An X-ray photoelectron spectrometer (XPS) built in an ultrahigh vacuum system allowed the in-situ monitoring of the photocathode surface beginning immediately after their cleaning and throughout the activation and degradation processes. An atomically clean surface is necessary to achieve a negative electron affinity, which is the main prerequisite for high quantum efficiency. The p-GaN samples were cleaned with ethanol and underwent a sub-sequential thermal vacuum cleaning. Although carbon and oxygen contaminations are expected to be undesired impurities from the metal organic chemical vapor deposition, which remained on the surface, p-GaN could still form a negative electron affinity surface when exclusively activated with cesium. After the activation with cesium, a shift to a higher binding energy of the photoemission peaks was observed, and a new species, a so-called cesium carbide, was formed, growing over time. The XPS data elucidated the critical role of these cesium carbide species in photocathode degradation. The X-ray damage to the p-GaN:Cs photocathodes, especially the influence on the cesium, was additionally discussed.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9950145PMC
http://dx.doi.org/10.1038/s41598-023-30329-0DOI Listing

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