Sidewall tilting is an important parameter to describe the grating morphology and would affect the diffraction efficiency of three-dimensional (3D) display devices based on pixelated nanogratings. However, there is currently a lack of a non-destructive measurement method that can accurately measure the sidewall tilting of the pixelated nanogratings. This is mainly because the kind of nanograting is manufactured in a micron-scale pixel region and the grating lines generally have various directions to ensure that the display device can display images smoothly. In this work, we propose to use a home-made imaging Mueller matrix ellipsometer (IMME) to monitor sidewall tilting of pixelated nanogratings. Simulation and experiments were carried out to characterize the sidewall tilting angle. Through the combination of Mueller matrix elements, we can quickly and qualitatively identify the tilting angle for the purpose of on-line quality monitoring of the device. Through the inverse calculation of the Mueller matrix, we can accurately and quantitatively obtain the value of the tilting, so as to meet the demands of the device design. It is expected the proposed method can provide guidance for the identification and detection of tilting in 3D display elements based on pixelated gratings.
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http://dx.doi.org/10.1364/OE.478503 | DOI Listing |
Sidewall tilting is an important parameter to describe the grating morphology and would affect the diffraction efficiency of three-dimensional (3D) display devices based on pixelated nanogratings. However, there is currently a lack of a non-destructive measurement method that can accurately measure the sidewall tilting of the pixelated nanogratings. This is mainly because the kind of nanograting is manufactured in a micron-scale pixel region and the grating lines generally have various directions to ensure that the display device can display images smoothly.
View Article and Find Full Text PDFWe propose and experimentally demonstrate a polarization independent subwavelength grating (SWG) waveguide Bragg grating (WBG) by using an SWG waveguide with tilted segments. By optimizing the tilting angle and other geometry parameters, such as the width and the length of the loading segments used to create the BG, we can obtain a zero birefringence tilted SWG waveguide and consequently, a polarization independent SWG WBG. In our simulations, the optimal tilting angle is ∼ 58°, whereas the optimal angle obtained in fabrication is ∼ 46°.
View Article and Find Full Text PDFFor the specific energy distribution of Gaussian laser, the obtained grooves always fall short in the sidewall verticality. To overcome this problem, the improvement of sidewall inclination in laser grooving of a CVD diamond is undertaken by the surface tilting motion control, where the insufficient material removal at the groove sidewall is relieved. Combined with finite element modelling, the influence of laser energy density, scanning speed, scanning times and scanning pitch on the inclination of sidewall are firstly analyzed, which shows that laser energy density is the main factor that dominates the sidewall inclination.
View Article and Find Full Text PDFBiosens Bioelectron
October 2022
School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210, PR China. Electronic address:
In this paper, we report on an integrated microfluidic digital PCR system for rapid and high-performance absolute quantification of DNA at a single-molecular level. Microchannel plate (MCP), a highly porous glass membrane conventionally used as a particle multiplier in detectors, is demonstrated here as an ideal platform for the sample partition and high-fidelity DNA detection. The density of the microreactors reaches up to 1563 mm, with a total number of 25,000 chambers each in 100 pL volumes embedded in 4 × 4 mm MCP.
View Article and Find Full Text PDFAppl Microsc
March 2022
Park Systems Corp., 109, Gwanggyo-ro, Yeongtong-gu, Suwon-si, 16229, South Korea.
As semiconductor device architecture develops, from planar field-effect transistors (FET) to FinFET and gate-all-around (GAA), there is an increased need to measure 3D structure sidewalls precisely. Here, we present a 3-Dimensional Atomic Force Microscope (3D-AFM), a powerful 3D metrology tool to measure the sidewall roughness (SWR) of vertical and undercut structures. First, we measured three different dies repeatedly to calculate reproducibility in die level.
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