Recent advances in flexible, stretchable, and wearable electronics have necessitated the development of more diverse and complex device structures; high-resolution patterning strategies for conducting polymers are therefore urgently required to enable the fabrication of these devices. In this study, we report a nanoscale patterning strategy for conductive polymer films that utilizes a combination of vapor phase polymerization (VPP) and colloidal lithography. Here, hemispherical non-close-packed colloidal crystals are used as an effective lithographic mask for patterning oxidants on a substrate; subsequently, two-dimensional honeycomb-structured porous poly(3,4-ethylenedioxythiophene) (PEDOT) films are fabricated VPP using the prepatterned oxidant. The resulting films closely resemble the morphology of the preceding oxidant structure; furthermore, the film porosity can be altered by adjusting the polymerization time. These patterned PEDOT films exhibit high transparency owing to the presence of voids, and high electrical sensitivity to bending stresses, which were concentrated in the narrow-patterned area. As the described fabrication methods are facile and reliable, this approach therefore provides an effective route for the fabrication of various conducting polymer frameworks in the micro- to nanoscale range.
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http://dx.doi.org/10.1039/d2nr07104e | DOI Listing |
J Colloid Interface Sci
December 2024
Faculty of Printing, Packaging Engineering and Digital Media Technology, Xi'an, University of Technology, Xi'an 710048, PR China.
The use of toxic resists and complex procedures has impeded the resolution and quality of micro/nanofabrication on virtually arbitrary substrates via photolithography. To fabricate a precise and high-resolution pattern, a sericin nanofilm-based coating was developed by reducing disulfide bonds and subsequently assembling sericin protein. Upon exposure to ultraviolet (UV) light, intermolecular amide bonds in sericin are cleaved through the action of a reducing agent, allowing the reduced sericin (rSer) coating to exhibit the functional ability to generate diverse geometric micro/nanopatterns through photomask-governed photolithography.
View Article and Find Full Text PDFJ Colloid Interface Sci
February 2025
School of Microelectronics and Communication Engineering, Chongqing Key Laboratory of Bio-perception & Intelligent Information Processing, Chongqing University, Chongqing 401331, PR China. Electronic address:
Shadow sphere lithography (SSL) offers unparalleled advantages in fabricating complex nanostructures, yet optimizing these structures remains challenging due to vast parameter spaces. This study presents a general optimization framework for SSL-fabricated nanostructures, demonstrated through chiral metamaterials. The approach combines a custom SSL program, a novel mathematical model for eliminating redundant structures, and machine learning (ML) analysis of finite-difference time-domain (FDTD) simulations.
View Article and Find Full Text PDFACS Appl Mater Interfaces
October 2024
Department of Mechanical and Aerospace Engineering, University of Florida, Gainesville, Florida 32611, United States.
The diffusion of uncured polydimethylsiloxane (PDMS) oligomers out of bulk PDMS elastomers is usually detrimental to many biomedical and microfluidic applications due to the inevitable contamination of the contacting fluids and substrates. Here, we transform this detrimental process into an enabling technology for achieving novel reconfigurable antireflection (AR) coatings, which are of great technological importance in the development of new nano-optical and optoelectronic applications. Self-assembled monolayer silica colloidal crystals are first used as sacrificial templates in fabricating nanoporous polymer AR coatings.
View Article and Find Full Text PDFSmall Methods
December 2024
National Engineering Research Center for Colloidal Materials, School of Chemistry and Chemical Engineering, Shandong University, 27 South Shanda Road, Ji'nan, Shandong, 250100, China.
Advanced photoresists must satisfy stringent sensitivity requirements while maintaining the ability to print ever-shrinking critical dimensions. However, the unavoidable acid diffusion associated with chemically amplified photoresists has led to a trade-off between resolution, line-edge roughness, and sensitivity, which presents a significant challenge for high-resolution lithography. To address this issue, a novel class of alkene-functionalized nonionic perfluorinated photoacid generators (PAGs) is developed.
View Article and Find Full Text PDFSmall
December 2024
Univ. Bordeaux, CNRS, Bordeaux INP, IMS, UMR 5218, Talence, F-33400, France.
In this study, innovative nanoscale devices are developed to investigate the charge transport in organic semiconductor nanoparticles. Using different steps of lithography techniques and dielectrophoresis, planar organic nano-junctions are fabricated from which hole mobilities are extracted in a space charge-limited current regime. Subsequently, these devices are used to investigate the impact of the composition and morphology of organic semiconductor nanoparticles on the charge mobilities.
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