AI Article Synopsis

  • The semiconductor industry is evolving, necessitating improved measurement techniques for analyzing small and complex nanostructures, particularly gratings on the nanometer scale.
  • A new compact measurement chamber has been developed to simultaneously capture both scattered signals and fluorescence from these nanoscale grating samples, allowing for a comprehensive analysis.
  • Initial experiments using this setup, situated at PTB's soft x-ray radiometry beamline in BESSY II, Berlin, have focused on testing industry-relevant structures to validate the system's specifications and capabilities.

Article Abstract

Smaller and more complex nanostructures in the semiconductor industry require a constant upgrade of accompanying metrological methods and equipment. A central task for nanometrology is the precise determination of structural features of gratings in the nanometer range as well as their elemental composition. Scatterometry and x-ray fluorescence in the soft x-ray and extreme ultraviolet spectral ranges are ideally suited to this task. We here present a new, compact measurement chamber that can simultaneously detect the elastically scattered signal and the fluorescence, originating from nanoscale grating samples. Its geometry enables detecting scattered intensity over a wide angular range with a variable angle of incidence. We show first experiments on industry-relevant test structures from the commissioning process alongside the specifications of the setup, located at PTB's soft x-ray radiometry beamline at the synchrotron radiation facility BESSY II in Berlin.

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Source
http://dx.doi.org/10.1063/5.0120146DOI Listing

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