Despite continuous developments of manufacturing technology for micro-devices and nano-devices, fabrication errors still exist during the manufacturing process. To reduce manufacturing costs and save time, it is necessary to analyze the effects of fabrication errors on the performances of micro-/nano-devices, such as the dielectric metasurface-based metalens. Here, we mainly analyzed the influences of fabrication errors in dielectric metasurface-based metalens, including geometric size and shape of the unit element, on the focusing efficiency and the full width at half maximum (FWHM) values. Simulation results demonstrated that the performance of the metasurface was robust to fabrication errors within a certain range, which provides a theoretical guide for the concrete fabrication processes of dielectric metasurfaces.
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| http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9787511 | PMC |
| http://dx.doi.org/10.3390/mi13122098 | DOI Listing |
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