Ultrafast laser patterning is an essential technology for the low-cost and large area production of flexible Organic Electronic (OE) devices, such as Organic Photovoltaics (OPVs). In order to unleash the potential of ultrafast laser processing to perform the selective and high precision removal of complex multilayers from printed OPV stacks without affecting the underlying nanolayers, it is necessary to optimize its parameters for each nanolayer combination. In this work, we developed an efficient on-the-fly picosecond (ps) laser scribing process (P1, P2 and P3) using single wavelength and single step/pass for the precise and reliable in-line patterning of Roll-to-Roll (R2R) slot-die-coated nanolayers. We have investigated the effect of the key process parameters (pulse energy and overlap) on the patterning quality to obtain high selectivity on the ablation of each individual nanolayer. Finally, we present the implementation of the ultrafast laser patterning process in the manufacturing of fully R2R printed flexible semitransparent OPV modules with a 3.4% power conversion efficiency and 91% Geometric Fill Factor (GFF).

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9692794PMC
http://dx.doi.org/10.3390/ma15228218DOI Listing

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