Role of solution concentration in formation kinetics of bromide perovskite thin films during spin-coating monitored by optical metrology.

RSC Adv

Department of Solution-Processed Materials and Devices, HySPRINT Innovation Lab, Helmholtz-Zentrum Berlin für Materialen und Energie GmbH Kekuléstraße 5 12489 Berlin Germany

Published: November 2022

Optoelectronic devices based on metal halide perovskites continue to show a improved performance, and solution-based coating techniques pave the way for large-area applications. However, not all parameters influencing the thin film formation process of metal halide perovskites are identified and entirely rationalised over their full compositional range, thus hampering optimised thin film fabrication. Furthermore, while the perovskite deposition spin-coating and annealing is an easily accessible technique, more profound insights into the chemical formation process are still lacking. Varying the precursor solution concentration is commonly used to vary the resulting thin film thickness. This study shows that varying the precursor solution concentration also affects the thin film morphology and optoelectronic quality. Hence, we herein investigate the influence of the precursor solution concentration on the formation process of a pure bromide-based triple cation perovskite (CsMAFAPbBr) by fiber-based optical measurement. During the spin-coating process, UV-vis and PL measurements reveal formation kinetics are strongly dependent on the concentration. Furthermore, we identify delayed nucleation and retarded growth kinetics for more concentrated precursor solutions. In addition, we quantify the shifting chemical equilibrium of colloidal pre-coordination in the precursor solution depending on concentration. Namely, colloids are pre-organised to a higher degree and higher-coordination lead-bromide complexes tend to form in more concentrated precursor solutions. Thus, the modified solution chemistry rationalises retarded perovskite formation kinetics and highlights the precursor concentration as an influential and optimisable parameter for solution-based thin film deposition.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9664315PMC
http://dx.doi.org/10.1039/d2ra06314jDOI Listing

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