In this work, we investigated the electronic structure, and mechanical, transport and optical properties of the van der Waals heterostructure formed from silicane (SiH) and Janus GaSSe monolayers using first-principles prediction. The out-of-plane symmetry in the Janus GaSSe monolayer leads to the formation of two different types of GaSSe/SiH heterostructure, namely SGaSe/SiH and SeGaS/SiH stacking patterns. All stacking patterns of the SiH/GaSSe heterostructure are thermodynamically, mechanically and energetically stable at room temperature. Furthermore, the generation of the SiH/GaSSe heterostructure gives rise to a reduction in the band gap, demonstrating that the electrons move faster from the valence bands to the conduction bands. The SiH/GaSSe heterostructure is a semiconductor with a direct band gap of about 0.68 or 0.95 eV, depending on the stacking pattern. The SiH/GaSSe heterostructure forms type-II band alignment for all stacking patterns, indicating that the photogenerated carriers are separated effectively, thus enhancing the photocatalytic performance. Moreover, the carrier mobilities for electrons and holes of the GaSSe/SiH heterostructure are higher than those of the constituent SiH and GaSSe monolayers in both the and directions, suggesting that the performances of electronic devices based on the GaSSe/SiH heterostructure would be excellent and reliable. The formation of the GaSSe/SiH heterostructure also gives rise to an enhancement of the absorption coefficient in both the visible and ultraviolet regions. Our findings could give valuable guidance for the design of high-efficiency devices based on the SiH/GaSSe heterostructure.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9641579PMC
http://dx.doi.org/10.1039/d2ra05723aDOI Listing

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