When a thermoelectric (TE) material is deposited with a secondary TE material, the total Seebeck coefficient of the stacked layer is generally represented by a parallel conductor model. Accordingly, when TE material layers of the same thickness are stacked vertically, the total Seebeck coefficient in the transverse direction may change in a single layer. Here, an abnormal Seebeck effect in a stacked two-dimensional (2D) PtSe /PtSe homostructure film, i.e., an extra in-plane Seebeck voltage is produced by wet-transfer stacking at the interface between the PtSe layers under a transverse temperature gradient is reported. This abnormal Seebeck effect is referred to as the interfacial Seebeck effect in stacked PtSe /PtSe homostructures. This effect is attributed to the carrier-interface interaction, and has independent characteristics in relation to carrier concentration. It is confirmed that the in-plane Seebeck coefficient increases as the number of stacked PtSe layers increase and observed a high Seebeck coefficient exceeding ≈188 µV K at 300 K in a four-layer-stacked PtSe /PtSe homostructure.
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http://dx.doi.org/10.1002/advs.202203455 | DOI Listing |
Adv Sci (Weinh)
January 2025
Information Materials and Intelligent Sensing Laboratory of Anhui Province, Key Laboratory of Structure and Functional Regulation of Hybrid Materials of Ministry of Education, Institutes of Physical Science and Information Technology, Anhui University, 111 Jiu Long Road, Hefei, 230601, China.
Unipolar barrier architecture is designed to enhance the photodetector's sensitivity by inducing highly asymmetrical barriers, a higher barrier for blocking majority carriers to depressing dark current, and a low minority carrier barrier without impeding the photocurrent flow through the channel. Depressed dark current without block photocurrent is highly desired for uncooled Long-wave infrared (LWIR) photodetection, which can enhance the sensitivity of the photodetector. Here, an excellent unipolar barrier photodetector based on multi-layer (ML) graphene (G) is developed, WSe, and PtSe (G-WSe-PtSe) van der Waals (vdW) heterostructure, in which extremely low dark current of 1.
View Article and Find Full Text PDFACS Appl Mater Interfaces
January 2025
College of Chemistry, Chemical Engineering and Environment, Minnan Normal University, Zhangzhou 363000, China.
Nano Lett
December 2024
Medical Innovation Technology Transformation Center, Shenzhen Key Laboratory of Nanozymes and Translational Cancer Research, Department of Otolaryngology, Shenzhen Institute of Translational Medicine, The First Affiliated Hospital of Shenzhen University, Shenzhen Second People's Hospital, Shenzhen 518039, China.
Melanoma, the most prevalent form of skin cancer, is primarily treated with surgical intervention. However, complete tumor cell removal is challenging, and surgical wounds are prone to infection, complicating treatment and increasing costs. The successful treatment of melanoma generally requires multifunctional agents that are coordinated in tumor therapy and wound healing.
View Article and Find Full Text PDFNanophotonics
August 2024
School of Physics, State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, China.
Platinum diselenide (PtSe), classified as a noble metal dichalcogenide, has garnered substantial interest owing to its layer-dependent band structure, remarkable air-stability, and high charge-carrier mobilities. These properties make it highly promising for a wide array of applications in next-generation electronic and optoelectronic devices, as well as sensors. Additionally, two-dimensional (2D) PtSe demonstrates significant potential as a saturable absorber due to its exceptional nonlinear optical response across an ultrabroad spectra range, presenting exciting opportunities in ultrafast and nonlinear photonics.
View Article and Find Full Text PDFACS Nano
December 2024
Department of Material Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea.
Metal conversion processes have been instrumental in advancing semiconductor technology by facilitating the growth of thin-film semiconductors, including metal oxides and sulfides. These processes, widely used in the industry, enhance the semiconductor manufacturing efficiency and scalability, offering convenience, large-area fabrication suitability, and high throughput. Furthermore, their application to emerging two-dimensional (2D) semiconductors shows promise in addressing spatial control and layer number control challenges.
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