The plasma-enhanced chemical vapor deposition (PECVD) technique has been utilized for the facile surface deposition of hydrogenated diamond-like carbon (HDLC) thin-films onto Si(100) substrates. The as-deposited film surface is homogenous, free of pinholes, and adheres to the substrate. Annealing of the synthesized HDLC surface in a vacuum was performed in the temperature range of 200 to 1000 °C. A host of instrumental techniques, FTIR spectroscopy, AFM, STM, and EC-AFM, were successfully employed to detect the morphological transformation in the HDLC films upon annealing. EC-AFM studies show irreversible biased behavior after undergoing a surface redox couple reaction and morphological change. Raman spectroscopy was carried out along with STM and EC-AFM to determine the functional nature and conductivity of the annealed surface.
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| http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9578290 | PMC |
| http://dx.doi.org/10.1039/d2ra06255k | DOI Listing |
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Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films.
RSC Adv
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Department of Chemistry, Sripat Singh College Jiaganj-742 123 Murshidabad West Bengal India.
The plasma-enhanced chemical vapor deposition (PECVD) technique has been utilized for the facile surface deposition of hydrogenated diamond-like carbon (HDLC) thin-films onto Si(100) substrates. The as-deposited film surface is homogenous, free of pinholes, and adheres to the substrate. Annealing of the synthesized HDLC surface in a vacuum was performed in the temperature range of 200 to 1000 °C.
View Article and Find Full Text PDFSynthesis and Characterization of Hydrogenated Diamond-Like Carbon (HDLC) Nanocomposite Films with Metal (Ag, Cu) Nanoparticles.
Materials (Basel)
April 2020
Research Unit for Nanostructured Materials Systems (RUNMS), Department of Mechanical Engineering and Materials science and Engineering, Cyprus University of Technology, Limassol 3046, Cyprus.
In this work, the synthesis and characterization of hydrogenated diamond-like carbon (HDLC) nanocomposite thin films with embedded metallic Ag and Cu nanoparticles (NPs) are studied. These nanocomposite films were deposited using a hybrid technique with independent control over the carbon and metal sources. The metallic nanoparticles were directly deposited from the gas phase, avoiding surface diffusion of metal species on the deposition surface.
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