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Strain Relaxation of InAs Quantum Dots on Misoriented InAlAs(111) Metamorphic Substrates. | LitMetric

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Article Abstract

We investigate in detail the role of strain relaxation and capping overgrowth in the self-assembly of InAs quantum dots by droplet epitaxy. InAs quantum dots were realized on an In0.6Al0.4As metamorphic buffer layer grown on a GaAs(111)A misoriented substrate. The comparison between the quantum electronic calculations of the optical transitions and the emission properties of the quantum dots highlights the presence of a strong quenching of the emission from larger quantum dots. Detailed analysis of the surface morphology during the capping procedure show the presence of a critical size over which the quantum dots are plastically relaxed.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9607536PMC
http://dx.doi.org/10.3390/nano12203571DOI Listing

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