A New Cell Topology for 4H-SiC Planar Power MOSFETs for High-Frequency Switching.

Materials (Basel)

Department of Electrical and Computer Engineering, The Ohio State University, Columbus, OH 43210, USA.

Published: September 2022

A new cell topology named the dodecagonal (a polygon with twelve sides, short for Dod) cell is proposed to optimize the gate-to-drain capacitance (Cgd) and reduce the specific ON-resistance (Ron,sp) of 4H-SiC planar power MOSFETs. The Dod and the octagonal (Oct) cells are used in the layout design of the 650 V SiC MOSFETs in this work. The experimental results confirm that the Dod-cell MOSFET achieves a 2.2× lower Ron,sp, 2.1× smaller high-frequency figure of merit (HF-FOM), higher turn on/off dv/dt, and 29% less switching loss than the fabricated Oct-cell MOSFET. The results demonstrate that the Dod cell is an attractive candidate for high-frequency power applications.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9572954PMC
http://dx.doi.org/10.3390/ma15196690DOI Listing

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