Purpose/objectives: For foreign-trained dentists who seek requalification in United States dental schools, the acceptance rate is half that of applicants to traditional 4-year DDS/DMD programs. Unsuccessful applicants also lack clarity on how to strengthen their re-application. This is a comparison of foreign-trained dentists who successfully matriculated into the University of Michigan's advanced standing program and prospective students who have yet to matriculate into any advanced standing program.

Methods: We collected data through a survey on the website of the University of Michigan program for foreign-trained dentists-the Synergy Program is tuition-free and helps International Dental Program (IDP) applicants navigate the application process. Secondly, we surveyed those enrolled in the University of Michigan's IDP. We compared various characteristics of these two groups. Thirdly, we convened focus groups among the University of Michigan IDP and had unstructured discussions about barriers faced by internationally trained dentists in entering an IDP. University of Michigan Medical School Committee on Human Studies determined this research is "not regulated".

Results: There were 2400 unique visitors to the Synergy website. Among respondents, 1490 were female (62.1%). A total of 10.1% reported spending over $30,000 on strengthening their application. There were 38 individuals (out of a possible 60) in the University of Michigan's IDP who responded to the survey and 28 were female (73.7%). A total of 31.6% reported spending more than $30,000 on strengthening their application. We had focus groups with 12 IDP students. Regarding perceived differences that led to acceptance, all participants described the advantage in having a greater familiarity with American culture.

Conclusions: We found that those from wealthier households, those who are willing to spend more on their application process, and those who obtained an additional US degree were more likely to be matriculants in IDPs.

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http://dx.doi.org/10.1002/jdd.13102DOI Listing

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