This paper describes a simple, low-temperature, and environmentally friendly aqueous route for the layer-by-layer nanometric growth of crystalline α-FeO. The formation mechanism involves alternative sequences of the electrostatic adsorption of Fe ions on the surface and the subsequent onsite oxidation to Fe. A combination analysis of X-ray diffraction, scanning electron microscopy, UV-Vis spectroscopy, and X-ray photoelectron spectroscopy revealed that α-FeO is directly formed without post-growth annealing designed chemical reactions with a growth rate of 1.7 nm per deposition cycle. The obtained α-FeO layer exhibits electrocatalytic activity for water oxidation and, at the same time, insignificant photo-electrocatalytic response, indicating its defective nature. The electrocatalytic activity was tailored by annealing up to 500 °C in air, where thermal diffusion of Sn into the α-FeO lattice from the substrate probably provides an increased electrical conductivity. The subsequent surface-modification with Ni(OH) lowers the overpotential (250 mV at 0.5 mA cm) in a 1 M KOH solution. These findings open direct growth pathways to functional metal oxide nanolayers liquid phase atomic layer deposition.
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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9417511 | PMC |
http://dx.doi.org/10.1039/d0na00345j | DOI Listing |
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