A Multimodal Sensing Device for Simultaneous Measurement of Dissolved Oxygen and Hydrogen Ions by Monolithic Integration of FET-Based Sensors.

We examined the possibility of measuring dissolved oxygen by using a potentiometric solid-state semiconductor sensor. Thin films of tin (IV) oxide (SnO) are widely used in oxygen gas sensors. However, their ability to detect dissolved oxygen (DO) in solutions is still unknown. In this paper, we present a method for investigating the dissolved oxygen-sensing properties of SnO thin films in solutions by fabricating a SnO-gate field-effect transistor (FET). A similarly structured hydrogen ion-sensitive silicon nitride (SiN)-gate FET was fabricated using the same method. The transfer characteristics and sensitivities were experimentally obtained and compared. The transfer characteristics of the FET show a shift in threshold voltage in response to a decrease in DO concentration. The SnO-gate FET exhibited a sensitivity of 4 mV/ppm, whereas the SiN-gate FET showed no response to DO. Although the SnO-gate FET responds to pH changes in the solution, this sensitivity issue can be eliminated by using a SiN-gate FET, which is capable of selectively sensing hydrogen ions without DO sensitivity. The experimental results indicate the promising properties of SnO thin films for multimodal sensing applications.