Microprocessors use static random-access memory (SRAM) cells in the cache memory design. As a part of the central computing component, their performance is critical. Modern system-on-chips (SoC) escalate performance pressure because only 10-15% of the transistors accounts for logic, while the remaining transistors are for the cache memory. Moreover, modern implantable, portable and wearable electronic devices rely on artificial intelligence (AI), demanding an efficient and reliable SRAM design for compute-in-memory (CIM). For performance benchmark achievements, maintaining reliability is a major concern in recent technological nodes. Specifically, battery-operated applications utilize low-supply voltages, putting the SRAM cell's stability at risk. In modern devices, the off-state current of a transistor is becoming comparable to the on-state current. On the other hand, process variations change the transistor design parameters and eventually compromise design integrity. Furthermore, sensitive information processing, environmental conditions and charge emission from IC packaging materials undermine the SRAM cell's reliability. FinFET-SRAMs, with aggressive scaling, have taken operation to the limit, where a minute anomaly can cause failure. This article comprehensively reviews prominent challenges to the SRAM cell design after classifying them into five distinct categories. Each category explains underlying mathematical relations followed by viable solutions.
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http://dx.doi.org/10.3390/mi13081332 | DOI Listing |
Sci Adv
January 2025
Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-Based Electronics, School of Electronics, Peking University, Beijing 100871, China.
Multi-valued logics (MVLs) offer higher information density, reduced circuit and interconnect complexity, lower power dissipation, and faster speed over conventional binary logic system. Recent advancement in MVL research, particularly with emerging low-dimensional materials, suggests that breakthroughs may be imminent if multistates transistors can be fabricated controllably for large-scale integration. Here, a concept of source-gating transistors (SGTs) is developed and realized using carbon nanotubes (CNTs).
View Article and Find Full Text PDFPhys Chem Chem Phys
January 2025
Department of Electrical Engineering, College of Technical and Engineering, West Tehran Branch, Islamic Azad University, Tehran 1461944563, Iran.
Tunnel field-effect transistors (TFETs) are gaining interest for low-power applications, but challenges like poor drive current, delayed saturation, and ambipolarity can hinder their performance. This work proposes a dopingless heterojunction TFET (DL-HTDET) utilizing advanced materials, all based on phosphorus, to address these issues. Our approach involves a comprehensive and accurate analysis of the DL-HTDET's behavior.
View Article and Find Full Text PDFArch Microbiol
December 2024
School of Biochemical Engineering, Indian Institute of Technology (BHU), Varanasi, 221005, India.
Hydrogen (H) energy has garnered significant attention due to its numerous advantages. Nonetheless, for future commercialization, it is imperative to screen and identify strains with enhanced H-producing capacities. In order to attain a high and consistent production performance, the conversion of biomass sources into H requires careful selection of the most appropriate H-producing bacteria.
View Article and Find Full Text PDFNat Nanotechnol
July 2024
Graduate School of Advanced Technology, Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan.
Researchers have been developing 2D materials (2DM) for electronics, which are widely considered a possible replacement for silicon in future technology. Two-dimensional transition metal dichalcogenides are the most promising among the different materials due to their electronic performance and relatively advanced development. Although field-effect transistors (FETs) based on 2D transition metal dichalcogenides have been found to outperform Si in ultrascaled devices, the comparison of 2DM-based and Si-based technologies at the circuit level is still missing.
View Article and Find Full Text PDFMicromachines (Basel)
April 2024
Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200031, China.
This article proposes a novel design for an in-memory computing SRAM, the DAM SRAM CORE, which integrates storage and computational functionality within a unified 11T SRAM cell and enables the performance of large-scale parallel Multiply-Accumulate (MAC) operations within the SRAM array. This design not only improves the area efficiency of the individual cells but also realizes a compact layout. A key highlight of this design is its employment of a dynamic aXNOR-based computation mode, which significantly reduces the consumption of both dynamic and static power during the computational process within the array.
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