Immense Reduction in Interfacial Resistance between Sulfide Electrolyte and Positive Electrode.

ACS Appl Mater Interfaces

School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan.

Published: August 2022

AI Article Synopsis

  • The study investigates the interfacial resistance at the interface of a solid sulfide electrolyte and a LiCoO(001) electrode in all-solid-state Li batteries, revealing significant resistance due to an interphase mixed layer formation.
  • The discovery indicates that the high interfacial resistance is not caused by a space charge layer but by this mixed layer.
  • The introduction of a thin LiPO buffer layer dramatically reduces interfacial resistance by 2800 times, offering a promising strategy for improving the performance of all-solid-state Li batteries.

Article Abstract

Low interfacial resistance between the solid sulfide electrolyte and the electrode is critical for developing all-solid-state Li batteries; however, the origin of interfacial resistance has not been quantitatively reported in the literature. This study reports the resistance values across the interface between an amorphous LiPS solid electrolyte and a LiCoO(001) epitaxial thin film electrode in a thin-film Li battery model. High interfacial resistance is observed, which is attributed to the spontaneous formation of an interfacial layer between the solid electrolyte and the positive electrode upon contact. That is, the interfacial resistance originates from an interphase mixed layer instead of a space charge layer. The introduction of a 10 nm thick LiPO buffer layer between the solid electrolyte and positive electrode layers suppresses the formation of the interphase mixed layer, thereby leading to a 2800-fold decrease in the interfacial resistance. These results provide insight into reducing the interfacial resistance of all-solid-state Li batteries with sulfide electrolytes by utilizing buffer layers.

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Source
http://dx.doi.org/10.1021/acsami.2c05896DOI Listing

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