In this study, the influence of HCO on NO-induced photosensitive degradation of sulfamethoxazole (SMX) under UV irradiation was investigated. It was found that the removal of SMX by UV in the presence of NO improved significantly compared to its photolysis, which was confirmed to be due to the role of hydroxyl radical (HO) formed through UV-activated NO. However, the addition of HCO in UV/NO system could further enhance SMX degradation, which was verified to be ascribed to the formed carbonate radical (CO) through the reaction of HCO with HO. The second-order rate constant of CO with SMX was determined to be 2.58 × 10 M s. In UV/NO/HCO system, the reactive species for SMX removal were HO and CO, and the contribution of CO to SMX degradation might be much higher than that of HO. The concentration of NO was almost unchanged after reaction in UV/NO and UV/NO/HCO systems because of its regeneration. Based on the detected four transformation products, the possible degradation pathways of SMX in UV/NO/HCO system were proposed including hydroxylation, amino-oxidation and bond cleavage.
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