A large body of literature reports that both bismuth vanadate and haematite photoanodes are semiconductors with an extremely high doping density between 10 and 10 cm. Such values are obtained from Mott-Schottky plots by assuming that the measured capacitance is dominated by the capacitance of the depletion layer formed by the doping density within the photoanode. In this work, we show that such an assumption is erroneous in many cases because the injection of electrons from the collecting contact creates a ubiquitous capacitance step that is very difficult to distinguish from that of the depletion layer. Based on this reasoning, we derive an analytical resolution limit that is independent of the assumed active area and surface roughness of the photoanode, below which doping densities cannot be measured in a capacitance measurement. We find that the reported doping densities in the literature lie very close to this value and therefore conclude that there is no credible evidence from capacitance measurements that confirms that bismuth vanadate and haematite photoanodes contain high doping densities.
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http://dx.doi.org/10.1039/d1sc06401k | DOI Listing |
Molecules
January 2025
State Key Laboratory of Chemical Engineering, East China University of Science and Technology, Shanghai 200237, China.
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January 2025
College of Engineering and Technology, Southwest University, Chongqing 400715, China.
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January 2025
Department of Biological and Chemical Engineering, Jining Polytechnic, Jining 272037, China.
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January 2025
School of Material Science and Engineering, Shanghai University, Shanghai 200444, China.
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January 2025
CNR-IOM-Istituto Officina dei Materiali, Consiglio Nazionale delle Ricerche, 34149 Trieste, Italy.
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