AI Article Synopsis
- The study focuses on synthesizing and testing three types of photobase systems based on -nitrobenzyl for use in visible light-initiated thiol-Michael addition polymerizations.
- The modified base, MNPPOC, outperforms the standard NPPOC base and an ITX-sensitized system in terms of sensitivity to longer wavelengths of light and efficiency in photolysis.
- MNPPOC-TMG effectively initiates thiol-Michael polymerization with minimal visible light exposure, leading to a uniform cross-linked polymer network and broadening its potential applications in biocompatible and UV-sensitive materials.
Article Abstract
In this contribution, three -nitrobenzyl-based photobase systems were synthesized and evaluated for visible light initiated thiol-Michael addition polymerizations. With a modified structure, the (3,4-methylenedioxy-6-nitrophenyl)-propyloxycarbonyl (MNPPOC) protected base performance exceeds that of the nonsubstituted 2-(2-nitrophenyl)-propyloxycarbonyl (NPPOC) protected base and an ITX sensitized photobase system, with respect to both long-wavelength light sensitivity and photolytic efficiency. In material synthesis, MNPPOC-TMG is capable of initiating photo thiol-Michael polymerization efficiently and orthogonally with only limited visible light exposure and generating a highly homogeneous cross-linked polymer network. This approach enables the thiol-Michael "click" reaction to be conducted with a low-energy, visible light irradiation and, thus, expands its applications in biocompatible and UV sensitive materials.
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| http://dx.doi.org/10.1021/acsmacrolett.8b00435 | DOI Listing |
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