Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection.

Nanomaterials (Basel)

Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 310027, China.

Published: May 2022

A new silicon-controlled rectifier embedded diode (SCR-D) for 7 nm bulk FinFET process electrostatic discharge (ESD) protection applications is proposed. The transmission line pulse (TLP) results show that the proposed device has a low turn-on voltage of 1.77 V. Compared with conventional SCR and diode string, the proposed SCR-D has an additional conduction path constituting by two additional inherent diodes, which results in a 1.8-to-2.2-times current surge capability as compared with the simple diode string and conventional SCR with the same size. The results show that the proposed device meets the 7 nm FinFET process ESD design window and has already been applied in actual circuits.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9143253PMC
http://dx.doi.org/10.3390/nano12101743DOI Listing

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