Interface-Modulated Resistive Switching in Mo-Irradiated ReS for Neuromorphic Computing.

Coupling charge impurity scattering effects and charge-carrier modulation by doping can offer intriguing opportunities for atomic-level control of resistive switching (RS). Nonetheless, such effects have remained unexplored for memristive applications based on 2D materials. Here a facile approach is reported to transform an RS-inactive rhenium disulfide (ReS ) into an effective switching material through interfacial modulation induced by molybdenum-irradiation (Mo-i) doping. Using ReS as a model system, this study unveils a unique RS mechanism based on the formation/dissolution of metallic β-ReO filament across the defective ReS interface during the set/reset process. Through simple interfacial modulation, ReS of various thicknesses are switchable by modulating the Mo-irradiation period. Besides, the Mo-irradiated ReS (Mo-ReS ) memristor further exhibits a bipolar non-volatile switching ratio of nearly two orders of magnitude, programmable multilevel resistance states, and long-term synaptic plasticity. Additionally, the fabricated device can achieve a high MNIST learning accuracy of 91% under a non-identical pulse train. The study's findings demonstrate the potential for modulating RS in RS-inactive 2D materials via the unique doping-induced charged impurity scattering property.