AI Article Synopsis

  • The study explores how quantum spin Hall edge channels behave under strong magnetic fields, revealing that the expected transport gap does not appear in disordered topological insulators.
  • Instead, researchers find that a topological edge channel exists alongside a counterpropagating quantum Hall edge channel even in strong fields.
  • By adjusting disorder from fabrication methods, the research suggests that the observed quantum Hall edge channels are linked to a network of charge puddles at the device's edges.

Article Abstract

The survival of the quantum spin Hall edge channels in presence of an external magnetic field has been a subject of experimental and theoretical research. The inversion of Landau levels that accommodates the quantum spin Hall effect is destroyed at a critical magnetic field, and a trivial insulating gap appears in the spectrum for stronger fields. In this work, we report the absence of this transport gap in disordered two dimensional topological insulators in perpendicular magnetic fields of up to 16 T. Instead, we observe that a topological edge channel (from band inversion) coexists with a counterpropagating quantum Hall edge channel for magnetic fields at which the transition to the insulating regime is expected. For larger fields, we observe only the quantum Hall edge channel with transverse resistance close to h/e. By tuning the disorder using different fabrication processes, we find evidence that this unexpected ν = 1 plateau originates from extended quantum Hall edge channels along a continuous network of charge puddles at the edges of the device.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9106760PMC
http://dx.doi.org/10.1038/s41467-022-29815-2DOI Listing

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