Grafted iron(iii) ions significantly enhance NO oxidation rate and selectivity of TiO for photocatalytic NO abatement.

RSC Adv

DECHEMA-Forschungsinstitut Theodor-Heuss-Allee 25 60486 Frankfurt am Main Germany

Published: August 2018

Semiconductor photocatalysis could be an effective means to combat nitrogen oxides (NO ) based air pollution through mineralisation of NO to nitrate. However, most of the typically TiO-based catalysts employed show a much higher reactivity towards NO than NO, leading to an accumulation of this unwanted and toxic intermediate. By grafting the photocatalyst with small amounts (≤0.1 at%) of isolated iron(iii) ions, the reactivity towards NO is increased by the factor of 9, bringing it up to par with the NO-reactivity and alleviating the problem with intermediate accumulation. Consequently, the observed selectivity of the reaction is dramatically increased from less than 40% to more than 90%. The paper also discusses possible mechanisms for this very beneficial behavior.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9084282PMC
http://dx.doi.org/10.1039/c8ra05017aDOI Listing

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