We developed a procedure for direct patterning of graphene with arbitrary position, size, and shape on silicon substrates from a solid-state carbon source without dry etching processing. Our light emitting graphene devices perform on a par with those based on high crystallinity graphene obtained mechanical exfoliation or chemical vapor deposition.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9075755PMC
http://dx.doi.org/10.1039/c9ra07294bDOI Listing

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