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Evaluation of AA-CVD deposited phase pure polymorphs of SnS for thin films solar cells. | LitMetric

AI Article Synopsis

  • Six different thin-film solar cells with either orthorhombic (α-SnS) or cubic (π-SnS) tin(II) sulfide layers were created using temperature-controlled Aerosol Assisted Chemical Vapor Deposition (AA-CVD).
  • The growth conditions, including substrate materials like molybdenum (Mo) and Fluorine-doped Tin Oxide (FTO), significantly affected the thin-film morphology and characteristics, confirmed by X-ray diffraction (XRD) and Raman spectroscopy.
  • The best solar conversion efficiencies were 0.88% for α-SnS on FTO and 0.41% for π-SnS on am-TiO-FTO, with post-fabrication

Article Abstract

Six different thin film solar cells consisting of either orthorhombic (α-SnS) or cubic (π-SnS) tin(ii) sulfide absorber layers have been fabricated, characterized and evaluated. Absorber layers of either π-SnS or α-SnS were selectively deposited by temperature controlled Aerosol Assisted Chemical Vapor Deposition (AA-CVD) from a single source precursor. α-SnS and π-SnS layers were grown on molybdenum (Mo), Fluorine-doped Tin Oxide (FTO), and FTO coated with a thin amorphous-TiO layer (am-TiO -FTO), which were shown to have significant impact on the growth rate and morphology of the as deposited thin films. Phase pure α-SnS and π-SnS thin films were characterized by X-ray diffraction analysis (XRD) and Raman spectroscopy (514.5 nm). Furthermore, a series of PV devices with an active area of 0.1 cm were subsequently fabricated using a CdS buffer layer, intrinsic ZnO (i-ZnO) as an insulator and Indium Tin Oxide (ITO) as a top contact. The highest solar conversion efficiency for the devices consisting of the α-SnS polymorph was achieved with Mo ( = 0.82%) or FTO ( = 0.88%) as the back contacts, with respective open-circuit voltages ( ) of 0.135 and 0.144 V, and short-circuit current densities ( ) of 12.96 and 12.78 mA cm. For the devices containing the π-SnS polymorph, the highest efficiencies were obtained with the am-TiO -FTO ( = 0.41%) back contact, with a of 0.135 V, and of 5.40 mA cm. We show that mild post-fabrication hot plate annealing can improve the , but can in most cases compromise the . The effect of sequential annealing was monitored by solar conversion efficiency and external quantum efficiency (EQE) measurements.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9064236PMC
http://dx.doi.org/10.1039/c9ra01938cDOI Listing

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