In this study, we focused on understanding the roles of a polysilicon (poly-Si) layer in poly-Si/SiO /c-Si passivating contacts. Passivating contact formation conditions were varied by changing the doping method, annealing temperature and time, polysilicon layer thickness, and polysilicon doping concentration. Our observations indicated that the roles of polysilicon are contact, in-diffusion barrier action, field effect, gettering, and light absorption. Based on the observations, a i of 741 mV was obtained. Finally, to increase with high , the polysilicon was etched after hydrogenation to reduce light absorption with high passivation quality. i was not affected by etching; moreover, by etching the polysilicon from 300 nm to 60 nm, the cell efficiency increased from 20.48% to 20.59% with increasing , constant , and fill factor.

Download full-text PDF

Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC9067244PMC
http://dx.doi.org/10.1039/c9ra03560eDOI Listing

Publication Analysis

Top Keywords

passivating contacts
8
roles polysilicon
8
light absorption
8
polysilicon
6
role polysilicon
4
polysilicon poly-si/sio
4
poly-si/sio passivating
4
contacts high-efficiency
4
high-efficiency silicon
4
silicon solar
4

Similar Publications

Want AI Summaries of new PubMed Abstracts delivered to your In-box?

Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!