Effect of post-rinsing time and method on accuracy of denture base manufactured with stereolithography.

J Adv Prosthodont

Department of Gerodontology and Oral Rehabilitation, Graduate School of Medical and Dental Sciences, Tokyo Medical and Dental University, Yushima, Bunkyo, Tokyo, Japan.

Published: February 2022

Purpose: This study investigates the effect of different post-rinsing times and methods on the trueness and precision of denture base resin manufactured through stereolithography.

Materials And Methods: Ninety clear photopolymer resin specimens were fabricated and divided into nine groups (n = 10) based on rinsing times and methods. All specimens were rinsed with 99% isopropanol alcohol for 5, 10, and 15 min using three methods-automated, ultrasonic cleaning, and hand washing. The specimens were polymerized for 30 min at 40℃. For trueness, the scanned intaglio surface of each SLA denture base was superimposed on the original standard tessellation language (STL) file using best-fit alignment (n = 10). For precision, the scanned intaglio surface of the STL file in each specimen group was superimposed across each specimen (n = 45). The root mean square error (RMSE) was measured, and the data were analyzed statistically through one-way ANOVA and Tukey test (α < .05).

Results: The 10-min automated group exhibited the lowest RMSE. For trueness, this was significantly different from specimens in the 5-min hand-washed group ( < .05). For precision, this was significantly different from those of other groups ( < .05), except for the 15-min automated and 15-min ultrasonic groups. The color map results indicated that the 10-min automated method exhibited the most uniform distribution of the intaglio surface adaptation.

Conclusion: The optimal postprocessing rinsing times and methods for achieving clear photopolymer resin were found to be the automated method with rinsing times of 10 and 15 min, and the ultrasonic method with a rinsing time of 15 min.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC8891682PMC
http://dx.doi.org/10.4047/jap.2022.14.1.45DOI Listing

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