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The Use of Osseodensification for Ridge Expansion and Dental Implant Placement in Narrow Alveolar Ridges: A Prospective Observational Clinical Study. | LitMetric

AI Article Synopsis

  • The osseodensification (OD) drilling technique was evaluated to see how much it expands narrow alveolar ridges and affects implant stability in a clinical study involving 23 patients and 40 implants.
  • The study found an average alveolar ridge expansion of 1.29 mm, with a significant difference in bone width before and after the procedure (P < 0.001).
  • Additionally, both primary stability (73.73 ISQ) and secondary stability (74.83 ISQ) were statistically significant, showing the technique allowed for successful implant placement with a 100% survival rate and no complications like dehiscence or fenestration.

Article Abstract

The osseodensification (OD) drilling technique was suggested as an alveolar ridge expansion technique, so the aim of this prospective clinical study was to evaluate the amount of bone expansion obtained by the OD drilling technique and its effect on implant stability in patients with narrow alveolar ridges. The width of the alveolar ridge was measured at the crest before and after implant site preparation, whereas the implant stability was measured using Osstell Beacon implant stability quotient (ISQ). The ISQ values were recorded immediately postoperatively and after 16 weeks. Twenty-three patients were included; they received 40 implants. The mean (± standard deviation [SD]) amount of expansion was 1.29 (± 0.41) mm, and the difference between preexpansion and post-expansion bone width was statistically significant ( P < 0.001). The mean (± SD) primary stability was 73.73 (± 2.85) ISQ, whereas the mean (± SD) secondary stability was 74.83 (± 2.73) ISQ, and the difference was statistically significant ( P = 0.043). The implant survival rate was 100%. It can be concluded that using the OD technique in narrow alveolar ridges resulted in bone expansion without dehiscence or fenestration and allowed simultaneous implant placement with high primary and secondary implant stability.

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Source
http://dx.doi.org/10.1097/SCS.0000000000008624DOI Listing

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