Surface-bulk coupling in a BiTe nanoplate grown by van der Waals epitaxy.

Nanoscale

Beijing Key Laboratory of Quantum Devices, Key Laboratory for the Physics and Chemistry of Nanodevices, and School of Electronics, Peking University, Beijing 100871, China.

Published: February 2022

We report an experimental study of the effect of coherent surface-bulk electron scattering on quantum transport in a three-dimensional topological insulator BiTe nanoplate. The nanoplate is grown van der Waals epitaxy on a mica substrate and a top-gated Hall-bar device is fabricated from the nanoplate directly on the growth substrate. Top-gate voltage dependent measurements of the sheet resistance of the device reveal that the transport carriers in the nanoplate are of n-type and that, with decreasing top gate voltage, the carrier density in the nanoplate is decreased. However, the mobility is increased with decreasing top-gate voltage. This mobility increase with decreasing carrier density in the nanoplate is demonstrated to arise from a decrease in bulk-to-surface electron scattering rate. Low-field magnetotransport measurements are performed at low temperatures. The measured magnetoconductivity of the nanoplate shows typical weak anti-localization (WAL) characteristics. We analyze the measurements by taking surface-bulk inter-channel electron scattering into account and extract dephasing times , diffusion coefficients of electrons at the top surface and in the bulk, and the surface-bulk scattering times as a function of top-gate voltage and temperature. It is found that the dephasing in the nanoplate arises dominantly from electron-electron scattering with small energy transfers. It is also found that the ratio of / (a measure of the surface-bulk electron coherent coupling) is decreased with decreasing gate voltage or increasing temperature. We demonstrate that taking the surface-bulk coherent electron scattering in our BiTe nanoplate into account is essential to understand quantum transport measurements at low temperatures.

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Source
http://dx.doi.org/10.1039/d1nr08054gDOI Listing

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