Organ-on-a-chip (OoC) and microfluidic devices are conventionally produced using microfabrication procedures that require cleanrooms, silicon wafers, and photomasks. The prototyping stage often requires multiple iterations of design steps. A simplified prototyping process could therefore offer major advantages. Here, we describe a rapid and cleanroom-free microfabrication method using maskless photolithography. The approach utilizes a commercial digital micromirror device (DMD)-based setup using 375 nm UV light for backside exposure of an epoxy-based negative photoresist (SU-8) on glass coverslips. We show that microstructures of various geometries and dimensions, microgrooves, and microchannels of different heights can be fabricated. New SU-8 molds and soft lithography-based polydimethylsiloxane (PDMS) chips can thus be produced within hours. We further show that backside UV exposure and grayscale photolithography allow structures of different heights or structures with height gradients to be developed using a single-step fabrication process. Using this approach: (1) digital photomasks can be designed, projected, and quickly adjusted if needed; and (2) SU-8 molds can be fabricated without cleanroom availability, which in turn (3) reduces microfabrication time and costs and (4) expedites prototyping of new OoC devices.
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http://dx.doi.org/10.3390/mi13010049 | DOI Listing |
Nanoscale Adv
December 2024
Nano-Bio Laboratory, Special Centre for Nanoscience (SCNS), Jawaharlal Nehru University New Delhi 110067 India
Interleukin-8 (IL8) is an important cytokine that plays a significant role in tumor growth and angiogenesis across various malignant tumors, including oral squamous cell carcinoma (OSCC). It is an important biomarker for oral cancer; therefore, its early and accurate detection in bodily fluid reduces morbidity and mortality rates in cancer patients. The work presents the development of a label-free microfluidic miniaturized electrochemical immunosensor for IL8 biomarker detection at low concentration in saliva samples.
View Article and Find Full Text PDFNat Commun
August 2024
College of Polymer Science and Engineering, Sichuan University, Chengdu, China.
Efficiently exploring organic molecules through multi-step processes demands a transition from conventional laboratory synthesis to automated systems. Existing platforms for machine-assistant synthetic workflows compatible with multiple liquid-phases require substantial engineering investments for setup, thereby hindering quick customization and throughput increasement. Here we present a droplet-based chip that facilitates the self-organization of various liquid phases into stacked layers for conducting chemical transformations.
View Article and Find Full Text PDFMicromachines (Basel)
June 2024
Department of Electronics and Communication Engineering, Vel Tech Rangarajan Dr Sagunthala R&D Institute of Science and Technology, Chennai 600062, India.
As an alternative to SU-8 soft lithography, a new silicon mold process of fabricating PDMS microchannel chips was proposed. A picosecond laser is used to cut through a 550 μm thick silicon wafer and generate the original microchannel pattern with a 50 μm minimum feature size. This single-crystal silicon pattern, with the edge debris caused by laser cutting being trimmed off by a KOH solution and with the protection field oxide layer being removed by BOE afterwards, firmly resided on a glass substrate through the anodic bonding technique.
View Article and Find Full Text PDFAngew Chem Int Ed Engl
November 2024
College of Polymer Science and Engineering, Sichuan University, Chengdu, 610065, China.
Conventional approaches to creating high-resolution electric circuits face challenges such as the requirement for skilled personnel and expensive equipment. In response, we propose an innovative strategy that leverages a photochemically modified porous polymer skeleton for in-situ circuit fabrication. By developing maskless surface energy manipulation that guides PEDOT:PSS-based conductive ink deposition, electric circuits with high precision, density, stability and adaptability are effortlessly engineered within or atop the porous skeleton, enabling transitions between 2D and 3D circuit configurations.
View Article and Find Full Text PDFUltraviolet micro-LEDs show great potential as a light source for maskless photolithography. However, there are few reports on micro-LED based maskless photolithography systems, and the studies on the effects of system parameters on exposure patterns are still lacking. Hence, we developed a maskless photolithography system that employs micro-LEDs with peak wavelength 375 nm to produce micrometer-sized exposure patterns in photoresists.
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