Cross-sectional transmission electron microscopy of silicon LSI circuits and Josephson junction devices.

J Electron Microsc Tech

Beijing Laboratory of Electron Microscopy, People's Republic of China.

Published: December 1987

Cross-sectional transmission electron microscopy (XTEM) has been used to diagnose silicon LSI circuits and Josephson junction devices. For LSI circuits, some typical failure problems have been presented. For Nb-Si-Nb Josephson junction, microholes in the thin silicon layer have observed, and they are responsible for the short circuiting of these devices.

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http://dx.doi.org/10.1002/jemt.1060070411DOI Listing

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