AI Article Synopsis

  • The increasing need for precise microprofile measurements in semiconductor manufacturing and electronic glass screens has heightened interest in in situ dynamic white-light interferometry (DWLI).
  • A new vertical scanning DWLI method utilizing multiwavelength tilt iteration and sliding local least squares has been developed to address the challenge of making vibration-insensitive measurements.
  • The approach has been validated through numerical simulations and experiments, marking it as the first DWLI solution to achieve strong vibration resistance without relying on complicated compensation systems.

Article Abstract

The growing interest in microprofile measurements for advanced semiconductor manufacturing and electronic glass screens has stimulated the demand for in situ dynamic white-light interferometry (DWLI). However, it is challenging to perform vibration-insensitive measurements because of the broad-spectrum interference. In this Letter, we report a vertical scanning DWLI using multiwavelength tilt iteration and sliding local least squares. Numerical simulations and comparative experiments were conducted to verify the principle and performance of the proposed method. To the best of our knowledge, this is the first time such a DWLI has been proposed to achieve excellent vibration-resistant performance without using complex photoelectric compensation systems.

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Source
http://dx.doi.org/10.1364/OL.441379DOI Listing

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