AI Article Synopsis

  • - Chemical doping is crucial for enhancing charge transport in organic semiconductors, but n-doping is often less efficient than p-doping, typically achieving below 10% efficiency.
  • - The study introduces a new method for n-doping using air-stable precursor-type molecular dopants combined with transition metal catalysts (like Pt, Au, and Pd), which increases doping efficiency and electrical conductivity significantly.
  • - This innovative approach not only improves the performance of semiconductor devices but also creates new research avenues for the combination of catalysts, dopants, and semiconductors in n-doping applications.

Article Abstract

Chemical doping is a key process for investigating charge transport in organic semiconductors and improving certain (opto)electronic devices. N(electron)-doping is fundamentally more challenging than p(hole)-doping and typically achieves a very low doping efficiency (η) of less than 10%. An efficient molecular n-dopant should simultaneously exhibit a high reducing power and air stability for broad applicability, which is very challenging. Here we show a general concept of catalysed n-doping of organic semiconductors using air-stable precursor-type molecular dopants. Incorporation of a transition metal (for example, Pt, Au, Pd) as vapour-deposited nanoparticles or solution-processable organometallic complexes (for example, Pd(dba)) catalyses the reaction, as assessed by experimental and theoretical evidence, enabling greatly increased η in a much shorter doping time and high electrical conductivities (above 100 S cm; ref. ). This methodology has technological implications for realizing improved semiconductor devices and offers a broad exploration space of ternary systems comprising catalysts, molecular dopants and semiconductors, thus opening new opportunities in n-doping research and applications.

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Source
http://dx.doi.org/10.1038/s41586-021-03942-0DOI Listing

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