A minireview on chemical vapor deposition growth of wafer-scale monolayer -BN single crystals.

Hexagonal boron nitride (-BN), with its excellent stability, flat surface, and large bandgap, plays a role in a variety of fundamental science and technology fields. The past few years have witnessed significant development in the scaled growth of -BN single crystals. Currently, the size of -BN crystal can be reached up to wafer-scale, paving the way towards industrial production and commercial applications. In this minireview, recent academic breakthroughs regarding the controlled growth of large-sized -BN single crystals chemical vapor deposition (CVD) are presented. The as-developed technique in terms of growth parameters, choice of catalysts, and the mechanism is fully emphasized, offering a guideline in enhancing the size and quality of -BN. Several typical metal catalysts have been used in shaping scaled -BN single crystals, of which the metal Cu substrate has drawn the most intensive attention. The significant advances in expanding the size of -BN single crystals will largely push forward the way to -BN industrialization and commercialization. The past few years have witnessed significant development in the scaled growth of -BN single crystals. Currently, the size of -BN crystal can be reached up to wafer-scale, paving the way towards industrial production and commercial applications. In this minireview, recent academic breakthroughs regarding controlled growth of large-sized -BN single crystals chemical vapor deposition (CVD) are present. The as-developed technique in terms of growth parameters, choice of catalysts and mechanism is fully emphasized, offering a guideline in enhancing size and quality of -BN. Several typical metal catalysts are exhibited in shaping scaled -BN single crystals, of which the metal Cu substrate has drawn the most intensive attentions.