Niobium oxide thin films have been prepared by spin-coating aqueous solutions of tetramethylammonium salts of the isostructural polyoxometalate clusters [NbO], [TiNbO] and [TiNbO] onto silicon wafers, and annealing them. The [NbO] cluster yields films of NbO in the orthorhombic and monoclinic crystal phases when annealed at 800 °C and 1000 °C, respectively, whereas the [TiNbO] and [TiNbO] clusters yield the monoclinic crystal phases of TiNbO and TiNbO (titanium-niobium oxides) in different ratios. We also demonstrate a protocol for depositing successive layers of metal oxide films. Finally, we explore factors affecting the roughness of the films.
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| http://dx.doi.org/10.1039/d1dt03116c | DOI Listing |
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