Auto-controlled fabrication of a metal-porphyrin framework thin film with tunable optical limiting effects.

Metal-organic frameworks (MOFs) with third-order nonlinear optical (NLO) properties are still in their infancy but are very important. In this work, we first develop a layer by layer autoarm immersion method for preparing porphyrin-based MOF (PIZA-1) thin films with third-order NLO properties. By precisely controlling the thickness, the nonlinear absorption of PIZA-1 thin films can be switched continuously between reverse saturable absorption (RSA) and saturable absorption (SA) by using the Z-scan technique. In addition, the optical limiting effect could be further optimized by loading C in the pores of the PIZA-1 thin film. These findings not only open a new route for the exploitation of third-order NLO thin film materials, but also offer an insightful understanding of porphyrin-based MOF thin films for future broad practical applications.