Design method for the high optical efficiency and uniformity illumination system of the projector.

How to balance the optical efficiency, illumination uniformity and the size of the illumination system is a challenging task in projector design. In this paper, we present a mathematical model describing the relationship between optical energy of the illumination system and the optical parameters and an optimization design method considering the light intensity distribution of the light source. By using the proposed method, two illumination systems are designed with different types of the digital micromirror device chips. In addition, we also propose a non-coaxial system to solve the deformation problem caused by the large flip angle of the DMD chip and further improve the illumination uniformity based on Scheimpflug principle. The optical efficiency and illumination uniformity of the illumination systems were verified and analyzed. The results indicate that the systems designed by the proposed method can provide a good design scheme and obtain a satisfactory utilization rate of the optical energy and higher uniformity.