A New Approach for the Control and Reduction of Warpage and Residual Stresses in Bonded Wafer.

Micromachines (Basel)

Department of Civil and Environmental Engineering, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milano, Italy.

Published: March 2021

A geometrical modification on silicon wafers before the bonding process, aimed to decrease (1) the residual stress caused by glass frit bonding, is proposed. Finite element modeling showed that (2) by introducing this modification, the wafer out-of-plane deflection was decreased by 34%. Moreover, (3) fabricated wafers with the proposed geometrical feature demonstrated an improvement for the (4) warpage with respect to the plain wafers. A benefit for curvature variation and overall shape of the (5) bonded wafers was also observed.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC8066177PMC
http://dx.doi.org/10.3390/mi12040361DOI Listing

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