Electrografting of 4-Nitrobenzenediazonium Salts on Al-7075 Alloy Surfaces-The Role of Intermetallic Particles.

Nanomaterials (Basel)

Department of Technical and Macromolecular Chemistry, Paderborn University, Warburger Str. 100, 33098 Paderborn, Germany.

Published: March 2021

AI Article Synopsis

  • The study focuses on electrografting 4-nitrobenzenediazonium salt (4-NBD) films onto Al-7075 aluminium alloy, using various surface treatments to modify the aluminium oxide layer for better film formation.
  • The electrografting process was analyzed through cyclic voltammetry and multiple surface-analytical techniques, establishing a correlation between the passive film state, intermetallic particle distribution, and film formation.
  • Results indicate that the formation of 4-NBD films is dependent on the applied potential, with different voltage ranges favoring film growth either on the aluminium oxide or on intermetallic particles.

Article Abstract

In this work, the electrografting of Al-7075 aluminium alloy substrates with 4-nitrobenzenediazonium salt (4-NBD) films was studied on a complex aluminium alloy surface. Prior to the electrografting reaction, the substrates were submitted to different surface treatments to modify the native aluminium oxide layer and unveil intermetallic particles (IMPs). The formation of the 4-NBD films could be correlated with the passive film state and the distribution of IMPs. The corresponding electrografting reaction was performed by cyclic voltammetry which allowed the simultaneous analysis of the redox reaction by a number of complementary surface-analytical techniques. Spatially resolved thin film analysis was performed by means of SEM-EDX, AFM, PM-IRRAS, Raman spectroscopy, XPS, and SKPFM. The collected data show that the 4-NBD film is preferentially formed either on the Al oxide layer or the IMP surface depending on the applied potential range. Potentials between -0.1 and -1.0 V mostly generated nitrophenylene films on the oxide covered aluminium, while grafting between -0.1 and -0.4 V favours the growth of these films on IMPs.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC8067352PMC
http://dx.doi.org/10.3390/nano11040894DOI Listing

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