Cephalic vein access by modified Seldinger technique for lead implantations.

Pacing Clin Electrophysiol

Department of Cardiology, Catharina Hospital, Eindhoven, The Netherlands.

Published: April 2021

AI Article Synopsis

  • The study explores a new method for venous access in cardiac implantable electronic devices (CIED), focusing on a simplified cephalic venous access using a modified Seldinger technique.
  • In a year-long study involving 221 patients, 83% had suitable cephalic veins, allowing for successful lead placements in most cases (98% for single- or dual-chamber devices and 72% for cardiac resynchronization therapy).
  • The findings suggest this novel technique offers high success rates and fewer complications compared to traditional methods like subclavian vein puncture.

Article Abstract

Background: Venous access for cardiac implantable electronic devices (CIED) is commonly performed by cephalic venous cut down, or axillary or subclavian vein puncture. The latter technique carries a risk of complications such as pneumothorax or lead crush. Cephalic venous cut down is free of these complications but often less successful due to technical difficulties. We report a highly successful, simplified cephalic venous access with a modified Seldinger technique.

Methods: We prospectively studied 221 patients undergoing de novo implantation of a one, two, or three lead device system performed over a 1-year period at our center, and assessed the efficacy of the cephalic vein access including the number of leads successfully placed for each procedure.

Results: In 83% of patients undergoing CIED implantation, a suitable cephalic vein was present. In respectively 98% and 99% of patients undergoing single- or dual-chamber CIED implantation, lead placement could be performed exclusively via the cephalic vein and in 72% of cardiac resynchronization therapy implants, all three leads were placed via cephalic access.

Conclusion: A novel, technically simple cephalic venous catheterization technique provides high success rates for any CIED lead implantation.

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Source
http://dx.doi.org/10.1111/pace.14200DOI Listing

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