Lewis Acid Strength of Interfacial Metal Sites Drives CH OH Selectivity and Formation Rates on Cu-Based CO Hydrogenation Catalysts.

Angew Chem Int Ed Engl

Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1-5, 8093, Zürich, Switzerland.

Published: April 2021

CH OH formation rates in CO hydrogenation on Cu-based catalysts sensitively depend on the nature of the support and the presence of promoters. In this context, Cu nanoparticles supported on tailored supports (highly dispersed M on SiO ; M=Ti, Zr, Hf, Nb, Ta) were prepared via surface organometallic chemistry, and their catalytic performance was systematically investigated for CO hydrogenation to CH OH. The presence of Lewis acid sites enhances CH OH formation rate, likely originating from stabilization of formate and methoxy surface intermediates at the periphery of Cu nanoparticles, as evidenced by metrics of Lewis acid strength and detection of surface intermediates. The stabilization of surface intermediates depends on the strength of Lewis acid M sites, described by pyridine adsorption enthalpies and C chemical shifts of -OCH coordinated to M; these chemical shifts are demonstrated here to be a molecular descriptor for Lewis acid strength and reactivity in CO hydrogenation.

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Source
http://dx.doi.org/10.1002/anie.202100672DOI Listing

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