EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging.

Sensors (Basel)

Laboratoire d'Optique Appliquée, CNRS, ENSTA Paris, Ecole Polytechnique IP Paris, 91120 Palaiseau, France.

Published: January 2021

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC7865934PMC
http://dx.doi.org/10.3390/s21030874DOI Listing

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