The past few decades have witnessed growing research interest in developing powerful nanofabrication technologies for three-dimensional (3D) structures and devices to achieve nano-scale and nano-precision manufacturing. Among the various fabrication techniques, focused ion beam (FIB) nanofabrication has been established as a well-suited and promising technique in nearly all fields of nanotechnology for the fabrication of 3D nanostructures and devices because of increasing demands from industry and research. In this article, a series of FIB nanofabrication factors related to the fabrication of 3D nanostructures and devices, including mechanisms, instruments, processes, and typical applications of FIB nanofabrication, are systematically summarized and analyzed in detail. Additionally, current challenges and future development trends of FIB nanofabrication in this field are also given. This work intends to provide guidance for practitioners, researchers, or engineers who wish to learn more about the FIB nanofabrication technology that is driving the revolution in 3D nanostructures and devices.
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http://dx.doi.org/10.1039/d0nr07539f | DOI Listing |
Nanomaterials (Basel)
November 2024
Institute of Solid State Physics, University of Latvia, 8 Kengaraga St., LV-1063 Riga, Latvia.
This article presents an examination of well-controlled patterns created using a Ga-based focused ion beam (FIB) on glass, while silicon substrates were used to evaluate the FIB performance by its achievable feature size versus time constraints. The pattern creation on glass was developed with the aim of studying potential surface-enhanced Raman spectroscopy (SERS) applications. Furthermore, the FIB was used to create dimer systems of periodically and randomly positioned dumbbell-shaped pits on the glass (each dimer occupies an area of 203 × 87 nm).
View Article and Find Full Text PDFACS Appl Mater Interfaces
October 2024
School of Mathematical and Physical Sciences, University of Technology Sydney, Ultimo, New South Wales 2007, Australia.
Focused ion beam (FIB) techniques are employed widely for nanofabrication and processing of materials and devices. However, ion irradiation often gives rise to severe damage due to atomic displacements that cause defect formation, migration, and clustering within the ion-solid interaction volume. The resulting restructuring degrades the functionality of materials and limits the utility of FIB ablation and nanofabrication techniques.
View Article and Find Full Text PDFAngew Chem Int Ed Engl
July 2024
Department of Chemistry, University of Virginia, Charlottesville, VA 22901, USA.
In vivo electrochemistry in small brain regions or synapses requires nanoelectrodes with long straight tips for submicron scale measurements. Nanoelectrodes can be fabricated using a Nanoscribe two-photon printer, but annealed tips curl if they are long and thin. We propose a new pulling-force strategy to fabricate a straight carbon nanoneedle structure.
View Article and Find Full Text PDFBeilstein J Nanotechnol
February 2024
Dynamics of Molecules and Clusters Department, J. Heyrovský Institute of Physical Chemistry of the CAS, Dolejškova 3, Prague, 182 23, Czech Republic.
DNA origami nanostructures are emerging as a bottom-up nanopatterning approach. Direct combination of this approach with top-down nanotechnology, such as ion beams, has not been considered because of the soft nature of the DNA material. Here we demonstrate that the shape of 2D DNA origami nanostructures deposited on Si substrates is well preserved upon irradiation by ion beams, modeling ion implantation, lithography, and sputtering conditions.
View Article and Find Full Text PDFNanoscale
October 2023
Tianjin Key Lab for Rare Earth Materials and Applications, Center for Rare Earth and Inorganic Functional Materials, School of Materials Science and Engineering, Nankai University, Tianjin 300350, China.
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