In this study, the high-density SiC/SiO core-shell nanowires were synthesized on the nickel coated SiO (100 nm)/Si substrate by chemical vapor deposition (CVD) method with ferrocene precursor at temperature 1000 °C compared to previous studies (1300-1600 °C). The present work provides an efficient strategy for the production of SiC/SiO nanowires with uniform morphology and good optical properties, where the Ni layer plays important roles for this fabrication at low temperature which reduces the decomposition temperature of hydrocarbon gases and improves the growth quality of SiC nanowires. The as-synthesized SiC/SiO nanowires consist of single crystal 3C structures as well as 3C structures with defects along [111] direction. In the photoluminescence (PL) spectrum, the SiC/SiO core-shell nanowires revealed an obvious blueshift. The blueshift is due to the formation of nanoscale silicon carbide polytypism caused by the stacking faults in 3C-SiC and the nanoscale polytypism also caused the transition from indirect to direct bandgap which explains why the stacking faults percentage in SiC confirmed from X-ray diffraction (XRD) is 19%, but ultimately makes the strongest emission intensity. Finally, the PL characteristics are further improved by changing the diameter of the SiC nanowire and etching and an approximate model followed by the vapor-liquid-solid (VLS) mechanism was proposed to explain the possible growth mechanism of the SiC/SiO nanowires.
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http://dx.doi.org/10.1038/s41598-020-80580-y | DOI Listing |
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December 2024
School of Materials Science and Engineering, Zhengzhou University, Zhengzhou, 450001, China.
Discov Nano
April 2023
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan.
The relatively low output performance of triboelectric nanogenerator (TENG), which faces a challenge in performance improvement, limits its practical applications. Here, a high-performance TENG consisting of a silicon carbide@silicon dioxide nanowhiskers/polydimethylsiloxane (SiC@SiO/PDMS) nanocomposite film and a superhydrophobic aluminum (Al) plate as triboelectric layers is demonstrated. The 7 wt% SiC@SiO/PDMS TENG presents a peak voltage of 200 V and a peak current of 30 μA, which are ~ 300 and ~ 500% over that of the PDMS TENG, owing to an increase in dielectric constant and a decrease in dielectric loss of the PDMS film because of electric insulated SiC@SiO nanowhiskers.
View Article and Find Full Text PDFACS Appl Mater Interfaces
January 2023
Department of Mechanical Engineering, State Key Laboratory of Tribology, Key Laboratory for Advanced Manufacturing by Materials Processing Technology, Ministry of Education of PR China, Tsinghua University, Beijing 100084, P. R. China.
Field-effect transistor (FET) devices with multi-gate coupled structures usually exhibit special electrical properties and are suitable for fabricating multifunctional devices. Among them, the 1D nanowire gate configuration has become a promising gate design to tailor 2D FET performances. However, due to possible short circuiting induced by nanowire contact and the high requirement for precision manipulation, the integration of multi-nanowires as gates in a single 2D electronic system remains a grand challenge.
View Article and Find Full Text PDFJ Colloid Interface Sci
December 2022
College of Electrical Engineering, Sichuan University, Chengdu 610065, China; State Key Lab of the Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, PR China.
Polymer-based dielectrics with high thermal conductivity and superb dielectric properties hold great promising for advanced electronic packaging and thermal management application. However, integrating these properties into a single material remains challenging due to their mutually exclusive physical connotations. Here, an ideal dielectric thermally conductive epoxy composite is successfully prepared by incorporating multiscale hybrid fillers of boron nitride microsphere (BNMS) and silicon dioxide coated silicon carbide nanoparticles (SiC@SiO).
View Article and Find Full Text PDFJ Chem Phys
March 2022
School of Physics, Southeast University, Nanjing 211189, People's Republic of China.
Silicon carbide is an important wide-bandgap semiconductor with wide applications in harsh environments and its applications rely on a reliable surface, with dry or wet oxidation to form an insulating layer at temperatures ranging from 850 to 1250 °C. Here, we report that the SiC quantum dots (QDs) with dimensions lying in the strong quantum confinement regime can be naturally oxidized at a much lower temperature of 220 °C to form core/shell and heteroepitaxial SiC/SiO QDs with well crystallized silica nanoshells. The surface silica layer enhances the radiative transition rate of the core SiC QD by offering an ideal carrier potential barrier and diminishes the nonradiative transition rate by reducing the surface dangling bonds, and, as a result, the quantum yield is highly improved.
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