Chemical-Structure Evolution Model for the Self-Assembling of Amine-Terminated Monolayers on Nanoporous Carbon-Doped Organosilicate in Tightly Controlled Environments.

Amine-terminated self-assembled monolayers are molecular nanolayers, typically formed via wet-chemical solution on specific substrates for precision surface engineering or interface modification. However, homogeneous assembling of a highly ordered monolayer by the facile, wet method is rather tricky because it involves process parameters, such as solvent type, molecular concentration, soaking time and temperature, and humidity level. Here, we select 3-aminopropyltrimethoxysilane (APTMS) as a model molecule of aminosilane for the silanization of nanoporous carbon-doped organosilicate (p-SiOCH) under tightly controlled process environments. Surface mean roughness () and the water contact angle (θ) of the p-SiOCH layers upon silanization at a 10% humidity-controlled environment behave similarly and follow a three-stage evolution: a leap to a maximum at 15 min for (from 0.227 to 0.411 nm) and θ (from 25 to 86°), followed by a gradual decrease to 0.225 nm and 69, finally leveling off at the above values (>60 min). The -NH fraction indicating monolayer disorientation evolves in a similar fashion. The fully grown monolayer is highly oriented yielding an unprecedented low -NH fraction of 0.08 (and 0.92 of upright -NH groups). However, while having a similar thickness of approximately 1.4 ± 0.1 nm, the molecular layers grown at 30% relative humidity exhibit a significantly elevated -NH fraction of 0.42, indicating that controlling the humidity is vital to the fabrication of highly oriented APTMS molecular layers. A bonding-structure evolution model, as distinct from those offered previously, is proposed and discussed.