Single-Crystalline All-Oxide α-γ-β Heterostructures for Deep-Ultraviolet Photodetection.

ACS Appl Mater Interfaces

Photonics Laboratory, Computer, Electrical and Mathematical Sciences and Engineering Division (CEMSE), King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia.

Published: December 2020

Recent advancements in gallium oxide (GaO)-based heterostructures have allowed optoelectronic devices to be used extensively in the fields of power electronics and deep-ultraviolet photodetection. While most previous research has involved realizing single-crystalline GaO layers on native substrates for high conductivity and visible-light transparency, presented and investigated herein is a single-crystalline β-GaO layer grown on an α-AlO substrate through an interfacial γ-InO layer. The single-crystalline transparent conductive oxide layer made of wafer-scalable γ-InO provides high carrier transport, visible-light transparency, and antioxidation properties that are critical for realizing vertically oriented heterostructures for transparent oxide photonic platforms. Physical characterization based on X-ray diffraction and high-resolution transmission electron microscopy imaging confirms the single-crystalline nature of the grown films and the crystallographic orientation relationships among the monoclinic β-GaO, cubic γ-InO, and trigonal α-AlO, while the elemental composition and sharp interfaces across the heterostructure are confirmed by Rutherford backscattering spectrometry. Furthermore, the energy-band offsets are determined by X-ray photoelectron spectroscopy at the β-GaO/γ-InO interface, elucidating a type-II heterojunction with conduction- and valence-band offsets of 0.16 and 1.38 eV, respectively. Based on the single-crystalline β-GaO/γ-InO/α-AlO all-oxide heterostructure, a vertically oriented DUV photodetector is fabricated that exhibits a high photoresponsivity of 94.3 A/W, an external quantum efficiency of 4.6 × 10%, and a specific detectivity of 3.09 × 10 Jones at 250 nm. The present demonstration lays a strong foundation for and paves the way to future all-oxide-based transparent photonic platforms.

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http://dx.doi.org/10.1021/acsami.0c15398DOI Listing

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